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発表年月
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タイトル／共同研究者
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掲載誌
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巻・号・頁
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学術機関等
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| 2025/03 |
Nanoscale imaging by cylindrical microstructure-assisted microscopy
Taichi Sano, Keito Tobe, Akihiro Tsuji, Kunpisit Kosumsupamala, Nitipon Puttaraksa, Hironori Seki, Yasuyuki Ishii, Tatsunosuke
Matsui, Hiroyuki Nishikawa
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JAPANESE JOURNAL OF APPLIED PHYSICS |
64巻
3号
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IOP Publishing Ltd |
| 2025/01 |
Precise Fabrication of Elongated Janus Microparticles
Nitipon Puttaraksa, Shuichi Sada, Kunpisit Kosumsupamala, Hironori Seki, Harry J. Whitlow, Hiroyuki Nishikawa
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Particle and Particle Systems Characterization |
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| 2024/03 |
Fabrication of engineered microplastics in an epoxy-based polymer (SU-8) by means of penetrating protons
Nitipon Puttaraksa, Kunpisit Kosumsupamala, Hironori Seki, Sumito Nagasawa, Hiroyuki Nishikawa
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Japanese Journal of Applied Physics |
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| 2023/10 |
Photonic nanojets generated by microfabricated dielectric cylinders using proton beam writing
Kunpisit Kosumsupamala, Keito Tobe, Akihiro Tsuji, Daiya Seya, Hironori Seki, Nitipon Puttaraksa, Tatsunosuke Matsui, Hiroyuki
Nishikawa
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Applied Physics Letters |
123巻
14号
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AIP Publishing |
| 2022/01 |
Wax gates in laminated microfluidic paper-based immunosensors
B.T. Tran, P. Rijiravanich, N. Puttaraksa, W. Surareungchai
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Microchemical Journal |
178巻
107343から
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|
| 2022/01 |
Utilizing a photosensitive dry film resist in proton beam writing
Hironori Seki, Keiya Kawamura, Hidetaka Hayashi, Yasuyuki Ishii, Nitipon Puttaraksa, Hiroyuki Nishikawa
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Japanese Journal of Applied Physics |
61巻
SD号
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IOP Publishing |
| 2020/01 |
Preparation of graphene nanocomposites from aqueous silver nitrate using graphene oxide’s peroxidase-like and carbocatalytic
properties
K. Garg, P. Papponen, A. Johansson, N. Puttaraksa, L. Gilbert
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Scientific Reports |
10巻
5号
5126から
5126ページまで
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|
| 2017/01 |
Development of economic MeV-ion microbeam technology at Chiang Mai University
S. Singkarat, N. Puttaraksa, S. Unai, L.D. Yu, K. Singkarat, N. Pussadee, H.J. Whitlow, S. Natyanum, U. Tippawan
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Nucl. Instr. Meth. B |
404巻
58から
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| 2016/01 |
Development of a microfluidic design for an automatic lab-on-chip operation
Nitipon Puttaraksa, Harry J. Whitlow, Mari Napari, Leena Merilainen, Leona Gilbert
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Microfluidics and Nanofluidics |
20巻
10号
142から
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Springer Science and Business Media LLC |
| 2015/01 |
Single proton counting at the RIKEN cell irradiation facility
V. Mackel, N. Puttaraksa, T. Kobayashi, Y. Yamazaki
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Rev. Sci. Instrum. |
86巻
85103から
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| 2015/01 |
Irradiation of Fucci-expressing HeLa cells using a tapered glass capillary microbeam
N. Puttaraksa, V. Mackel, T. Kobayashi, T.M. Kojima, M. Hamagaki, N. Imamoto, Y. Yamazaki
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Nucl. Instr. Meth. B |
348巻
127から
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| 2015/01 |
Interaction of living cells with a high dose proton microbeam
V. Maeckel, N. Puttaraksa, T. Kobayashi, T. M. Kojima, N. Imamoto, Y. Yamazaki
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XXIX INTERNATIONAL CONFERENCE ON PHOTONIC, ELECTRONIC, AND ATOMIC COLLISIONS (ICPEAC2015), PTS 1-12 |
635巻
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IOP PUBLISHING LTD |
| 2013/01 |
Why are hydrogen ions best for MeV ion beam lithography?
R. Norarat, N. Puttaraksa, M. Napari, A.R. Ananda Sagari, M. Laitient, T. Sajavaara, P. Yotprayoonsak, M. Pettersson, O. Chienthavorn,
H.J. Whitlow
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Microelectron. Eng. |
102巻
22から
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| 2013/01 |
Fast and blister-free irradiation conditions for crosslinking of PMMA induced by 2 MeV protons
S. Unai, N. Puttaraksa, N. Pussadee, K. Singkarat, M.W. Rhodes, H.J. Whitlow, S. Singkarat
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Microelectron. Eng. |
102巻
18から
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| 2013/01 |
High speed microfluidic prototyping by programmable proximity aperture MeV ion beam lithography
Nitipon Puttaraksa, Mari Napari, Leena Merilainen, Harry J. Whitlow, Timo Sajavaara, Leona Gilbert
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Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms |
306巻
302から
306ページまで
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Elsevier BV |
| 2013/01 |
Advanced time-stamped total data acquisition control front-end for MeV ion beam microscopy and proton beam writing
Henri Kivisto, Mikko Rossi, Pete Jones, Rattanaporn Norara, Nitipon Puttaraksa, Timo Sajavaara, Mikko Laitinen, Vaino Hanninen,
Kimmo Ranttila, Pauli Heikkinen, Leona Gilber, Varpu Marjomaki, HarryJ. Whitlow
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Microelectron. Eng. |
102巻
9から
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| 2013/01 |
Development of procedures for programmable proximity aperture lithography
H.J. Whitlow, S. Gorelick, N. Puttaraksa, M. Napari, M.J. Hokkanen, R. Norarat
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Nucl. Instr. Meth. B |
306巻
307から
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| 2012/02 |
Lithography exposure characteristics of poly(methyl methacrylate) (PMMA) for carbon, helium and hydrogen ions
N. Puttaraksa, R. Norarat, M. Laitinen, T. Sajavaara, S. Singkarat, H.J. Whitlow
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Nucl. Instr. Meth. B |
272巻
162から
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| 2012/02 |
Fabrication of a negative PMMA master mold for soft-lithography by MeV ion beam lithography
N. Puttaraksa, S. Unai, M.W. Rhodes, K. Singkarat, H.J. Whitlow, S. Singkarat
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Nucl. Instr. Meth. B |
272巻
149から
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| 2012/01 |
Influence of MeV H+ ion beam flux on crosslinking and blister formation in PMMA resist
S. Unai, N. Puttaraksa, N. Pussadee, K. Singkarat, M.W. Rhodes, H.J. Whitlow, S. Singkarat
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Maejo Int. J. Sci. Technol. |
6(01)巻
70から
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| 2011/05 |
Direct writing of channels for microfluidics in silica by MeV ion beam lithography
N. Puttaraksa, M. Napari, O. Chienthavorn, R. Norarat, T. Sajavaara, M. Laitinen, S. Singkarat, H.J. Whitlow
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Advanced Materials Research |
254巻
132から
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| 2010/01 |
In-situ ion beam fluence monitoring system for MeV ion beam lithography at CMU
N. Puttaraksa, M.W. Rhodes, T. Kamwanna, U. Tippawan, C. Thongleurm, W. Ginamoon, H.J. Whitlow, S. Singkarat
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THAI JOURNAL OF PHYSICS |
SERIES 5巻
163から
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| 2009/01 |
3D micro-channel fabrication in PMMA based on MeV ion beam lithography
N. Puttaraksa, S. Gorelick, T. Sajavaara, S. Singkarat, H.J. Whitlow
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THAI JOURNAL OF PHYSICS |
SERIES 4巻
89から
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| 2008/09 |
Programmable proximity aperture lithography with MeV ion beams
N. Puttaraksa, S. Gorelick, T. Sajavaara, M. Laitinen, S. Singkarat, H.J. Whitlow
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J. Vac. Sci. Technol. B |
26巻
1732から
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| 2008/03 |
Fabrication of microfluidic devices using MeV ion beam programmable proximity aperture lithography (PPAL)
S. Gorelick, N. Puttaraksa, T. Sajavaara, M. Laitinen, S. Singkarat, H.J. Whitlow
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Nucl. Instr. Meth. B |
266巻
2461から
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| 2007/12 |
Resolution performance of programmable proximity aperture MeV ion beam lithography system
S. Gorelick, T. Sajavaara, M. Laitinen, N. Puttaraksa, H.J. Whitlow
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Mater. Res. Soc. Symp. Proc. |
1020巻
304号
67から
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