|
発表年月
|
タイトル／共同研究者
|
掲載誌
|
巻・号・頁
|
学術機関等
|
| 2025/03 |
Nanoscale imaging by cylindrical microstructure-assisted microscopy
Taichi Sano, Keito Tobe, Akihiro Tsuji, Kunpisit Kosumsupamala, Nitipon Puttaraksa, Hironori Seki, Yasuyuki Ishii, Tatsunosuke
Matsui, Hiroyuki Nishikawa
|
JAPANESE JOURNAL OF APPLIED PHYSICS |
64巻
3号
|
IOP Publishing Ltd |
| 2025/01 |
Precise Fabrication of Elongated Janus Microparticles
Nitipon Puttaraksa, Shuichi Sada, Kunpisit Kosumsupamala, Hironori Seki, Harry J. Whitlow, Hiroyuki Nishikawa
|
Particle and Particle Systems Characterization |
2400210から
|
|
| 2024/03 |
Fabrication of engineered microplastics in an epoxy-based polymer (SU-8) by means of penetrating protons
Nitipon Puttaraksa, Kunpisit Kosumsupamala, Hironori Seki, Sumito Nagasawa, Hiroyuki Nishikawa
|
Japanese Journal of Applied Physics |
63巻
3号
|
|
| 2023/10 |
Photonic nanojets generated by microfabricated dielectric cylinders using proton beam writing
Kunpisit Kosumsupamala, Keito Tobe, Akihiro Tsuji, Daiya Seya, Hironori Seki, Nitipon Puttaraksa, Tatsunosuke Matsui, Hiroyuki
Nishikawa
|
Applied Physics Letters |
123巻
14号
141102から
|
AIP Publishing |
| 2022/06 |
Utilizing a photosensitive dry film resist in proton beam writing
Hironori Seki, Keiya Kawamura, Hidetaka Hayashi, Yasuyuki Ishii, Nitipon Puttaraksa, Hiroyuki Nishikawa
|
Japanese Journal of Applied Physics |
61巻
SD号
|
|
| 2021/01 |
Dielectrophoretic devices fabricated by proton beam writing for concentration, assembly, and detection of nanoparticles
Hiroyuki Nishikawa, Toshiki Kimura, Ryousuke Kawashima, Ken Yamamoto, Satoshi Uchida, Yasuyuki Ishii
|
IEEJ Transactions on Fundamentals and Materials |
141巻
10号
574から
578ページまで
|
|
| 2020/01 |
Optical Communication and Positioning Method of Underwater Observation Apparatus for Environmental Monitor
Eriko Enomoto, Umamaheswari Rajagopalan, So Yoon Lee, Xiaobin Zhang, Yoshikazu Koike, Hideki Yokoi, Hiroyuki Nishikawa, Sumito
Nagasawa, Nobuyuki Futai, Takahiro Kohno, Jun Yamada, Masayuki Shimojo, Shigeki Matsuo
|
2020 10th Annual Computing and Communication Workshop and Conference, CCWC 2020 |
784から
788ページまで
|
|
| 2019/11 |
Refractive index change and thermo-optic effect in polydimethylsiloxane nanocomposites with oxide nanoparticles induced by
proton beam writing
Yuto Kaneko, Hidetaka Hayashi, Yasuyuki Ishii, Wataru Kada, Hiroyuki Nishikawa
|
Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms |
459巻
94から
97ページまで
|
|
| 2019/11 |
Electronic circuit formation on flexible polymer surface processed by 1 MV accelerated hydrogen molecular ions
Hidetaka Hayashi, Wataru Furukawa, Hiroyuki Nishikawa
|
Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms |
459巻
76から
80ページまで
|
|
| 2019/10 |
Assembling gold nanoparticles by dielectrophoresis with pit arrays on PMMA fabricated by proton beam writing
Taichi Shibuya, Satoshi Uchida, Yasuyuki Ishii, Hiroyuki Nishikawa
|
Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms |
456巻
60から
63ページまで
|
|
| 2017/08 |
Micro-structuring of epoxy resists containing nanoparticles by proton beam writing
Ryo Sano, Simon Hayakawa, Hidetaka Hayashi, Yasuyuki Ishii, Hiroyuki Nishikawa
|
Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms |
404巻
228から
232ページまで
|
ELSEVIER SCIENCE BV |
| 2017/08 |
Micro structure processing on plastics by accelerated hydrogen molecular ions
H. Hayashi, S. Hayakawa, H. Nishikawa
|
Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms |
404巻
233から
237ページまで
|
ELSEVIER SCIENCE BV |
| 2017/04 |
誘電泳動アセンブリにおける金ナノ粒子ダイナミクスのシミュレーション
中河原僚介, 内田諭, 澁谷泰一, 西川宏之
|
電気学会論文誌Ｅ(センサ・マイクロマシン部門誌） |
137巻
4号
107から
114ページまで
|
|
| 2017/01 |
TiO<sub>2</sub>/ポリジメチルシロキサンコンポジット材料の陽子線による改質
金子優斗, 林秀臣, 西川宏之
|
電気学会論文誌 A |
137巻
11号
652から
653ページまで
|
一般社団法人 電気学会 |
| 2015/10 |
Frequency dependence and assembly characteristics of silver nanomaterials trapped by dielectrophoresis
R. Kataoka, H. Tokita, S. Uchida, R. Sano, H. Nishikawa
|
Journal of Physics: Conference Series |
646巻
1号
|
IOP PUBLISHING LTD |
| 2015/09 |
ソフトリソグラフィによる誘電体ピラーを利用した3次元誘電泳動効果
渡部涼, 内田諭, 西川宏之
|
電気学会論文誌 A |
135巻
9号
548から
552ページまで
|
The Institute of Electrical Engineers of Japan |
| 2015/01 |
Development of embedded Mach-Zehnder optical waveguide structures in polydimethylsiloxane thin films by proton beam writing
W. Kada, K. Miura, H. Kato, R. Saruya, A. Kubota, T. Satoh, M. Koka, Y. Ishii, T. Kamiya, H. Nishikawa, O. Hanaizumi
|
Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms |
348巻
218から
222ページまで
|
ELSEVIER SCIENCE BV |
| 2014/11 |
Fabrication of polydimethylsiloxane microlens arrays on a plastic film by proton beam writing
Hijiri Kato, Junichi Takahashi, Hiroyuki Nishikawa
|
Journal of Vacuum Science and Technology B: Nanotechnology and Microelectronics |
32巻
6号
|
American Institute of Physics Inc. |
| 2013/11 |
Application of proton beam writing for the direct etching of polytetrafluoroethylene for polydimethylsiloxane replica molding
Hiroyuki Nishikawa, Takashi Hozumi
|
Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures |
31巻
6号
|
|
| 2013/02 |
Enhancing proton beam writing system with auto scanning software and stage movement
Truong Phi Nguyen, Ryo Teshima, Tadahiro Hasegawa, Hiroyuki Nishikawa
|
Microelectronic Engineering |
102巻
12から
17ページまで
|
|
| 2013/01 |
Control of refractive index of fluorinated polyimide by proton beam irradiation
Yukitaka Arai, Yoshimichi Ohki, Keisuke Saito, Hiroyuki Nishikawa
|
Japanese Journal of Applied Physics |
52巻
1号
|
|
| 2013/01 |
Fabrication of curved PDMS microstructures on silica glass by proton beam writing aimed for micro-lens arrays on transparent
substrates
Keisuke Saito, Hidetaka Hayashi, Hiroyuki Nishikawa
|
Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms |
306巻
284から
287ページまで
|
|
| 2012/09 |
Visualization of focused proton beam dose distribution by atomic force microscopy using blended polymer films based on polyacrylic
acid
Masaaki Omichi, Katsuyoshi Takano, Takahiro Satoh, Tomihiro Kamiya, Yasuyuki Ishii, Takeru Ohkubo, Masashi Koka, Wataru Kada,
Masaki Sugimoto, Hiroyuki Nishikawa, Shu Seki
|
Journal of Nanoscience and Nanotechnology |
12巻
9号
7401から
7404ページまで
|
AMER SCIENTIFIC PUBLISHERS |
| 2012/04 |
Fabrication of poly(9,9'-dioctylfluorene)-based nano- and microstructures by proton beam writing
Yuta Maeyoshi, Katsuyoshi Takano, Atsushi Asano, Hiromi Marui, Masaaki Omichi, Takahiro Satoh, Tomihiro Kamiya, Yasuyuki Ishii,
Takeru Ohkubo, Masashi Koka, Wataru Kada, Masaki Sugimoto, Hiroyuki Nishikawa, Akinori Saeki, Shu Seki
|
Japanese Journal of Applied Physics |
51巻
4 PART 1号
|
|
| 2012/01 |
Fabrication of polymer optical waveguides for the 1.5-μm band using focused proton beam
Kenta Miura, Yuki Machida, Masato Uehara, Masato Uehara, Hiromu Kiryu, Yusuke Ozawa, Tomoyuki Sasaki, Osamu Hanaizumi, Takahiro
Satoh, Yasuyuki Ishii, Masashi Kohka, Katsuyoshi Takano, Katsuyoshi Takano, Takeru Ohkubo, Akiyoshi Yamazaki, Wataru Kada,
Akihito Yokoyama, Tomihiro Kamiya, Hiroyuki Nishikawa
|
Key Engineering Materials |
497巻
147から
150ページまで
|
TRANS TECH PUBLICATIONS LTD |
| 2012/01 |
Versatile proton beam writing system with stage movement
Phi T. Nguyen, Nobukazu Kawakami, Tadahiro Hasegawa, Hiroyuki Nishikawa
|
IEEE International Conference on Nano/Molecular Medicine and Engineering, NANOMED |
51から
55ページまで
|
IEEE |
| 2012/01 |
Fabrication of Concave and Convex Structure Array Consisted of Epoxy Long-Nanowires by Light and Heavy Ion Beams Lithography
Takano Katsuyoshi, Sugimoto Masaki, Asano Atsushi, Maeyoshi Yuta, Marui Hiromi, Omichi Masaaki, Saeki Akinori, Seki Shu, Satoh
Takahiro, Ishii Yasuyuki, Kamiya Tomihiro, Ohkubo Takeru, Koka Masashi, Nishikawa Hiroyuki
|
Transactions of the Materials Research Society of Japan |
37巻
2号
237から
240ページまで
|
The Materials Research Society of Japan |
| 2012/01 |
Micro fabrication of poly L lacid and its application
Yoshikazu Koike, Hitoshi Takeuchi, Hiroki Hagiwara, Tomoki Ogura, Daichi Aoki, Ken Kumagai, Taku Ishikawa, Hiroyuki Nishikawa
|
1st IEEE Global Conference on Consumer Electronics 2012, GCCE 2012 |
60から
61ページまで
|
|
| 2012/01 |
Microprocessing of arched bridge structures with epoxy resin by proton beam writing
Katsuyoshi Takano, Atsushi Asano, Yuta Maeyoshi, Hiromi Marui, Masaaki Omichi, Akinori Saeki, Shu Seki, Takahiro Satoh, Yasuyuki
Ishii, Tomihiro Kamiya, Masashi Koka, Takeru Ohkubo, Masaki Sugimoto, Hiroyuki Nishikawa
|
Journal of Photopolymer Science and Technology |
25巻
1号
43から
46ページまで
|
|
| 2012/01 |
Mechanism and application of refractive index increase induced in fluorinated polyimide by ion irradiation
Y. Arai, Y. Ohki, K. Saito, H. Nishikawa
|
Annual Report - Conference on Electrical Insulation and Dielectric Phenomena, CEIDP |
705から
708ページまで
|
IEEE |
| 2012/01 |
Proton beam writer (PBW) for novel processing tool to increase surface utility of flexible printed circuits (FPC)
Hidetaka Hayashi, Hiroyuki Nishikawa
|
Electronics Goes Green 2012+, ECG 2012 - Joint International Conference and Exhibition, Proceedings |
|
IEEE |
| 2011/10 |
Microbeam complex at TIARA: Technologies to meet a wide range of applications
T. Kamiya, K. Takano, T. Satoh, Y. Ishii, H. Nishikawa, S. Seki, M. Sugimoto, S. Okumura, M. Fukuda
|
Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms |
269巻
20号
2184から
2188ページまで
|
ELSEVIER SCIENCE BV |
| 2011/08 |
Electroforming of Ni mold for imprint lithography using high-aspect-ratio PMMA microstructures fabricated by proton beam writing
Yusuke Tanabe, Hiroyuki Nishikawa, Yoshihiro Seki, Takahiro Satoh, Yasuyuki Ishii, Tomihiro Kamiya, Tohru Watanabe, Atsushi
Sekiguchi
|
Microelectronic Engineering |
88巻
8号
2145から
2148ページまで
|
ELSEVIER SCIENCE BV |
| 2011/01 |
Fabrication of PMMA film waveguides utilizing proton beam writing
Kenta Miura, Takahiro Satoh, Yasuyuki Ishii, Masashi Kohka, Yuki Machida, Masato Uehara, Hiromu Kiryu, Katsuyoshi Takano,
Takeru Ohkubo, Akiyoshi Yamazaki, Wataru Kada, Akihito Yokoyama, Tomihiro Kamiya, Hiroyuki Nishikawa, Tomoyuki Sasaki, Osamu
Hanaizumi
|
16th Opto-Electronics and Communications Conference, OECC 2011 |
303から
304ページまで
|
|
| 2010/05 |
Soft-lithographic methods for the fabrication of dielectrophoretic devices using molds by proton beam writing
Y. Shiine, H. Nishikawa, Y. Furuta, K. Kanamitsu, T. Satoh, Y. Ishii, T. Kamiya, R. Nakao, S. Uchida
|
Microelectronic Engineering |
87巻
5-8号
835から
838ページまで
|
ELSEVIER SCIENCE BV |
| 2010/01 |
Proton beam writing micro fabrication system for micro chemical devices
Phi Nguyen Truong, Ryo Teshima, Tadahiro Hasegawa, Hiroyuki Nishikawa
|
2010 International Symposium on Micro-NanoMechatronics and Human Science: From Micro and Nano Scale Systems to Robotics and
Mechatronics Systems, MHS 2010, Micro-Nano GCOE 2010, Bio-Manipulation 2010
|
435から
440ページまで
|
|
| 2010/01 |
プロトンビーム描画による光導波路デバイス形成の基礎検討
三浦健太, 佐藤隆博, 江夏昌志, 石井保行, 高野勝昌, 大久保猛, 加田渉, 山崎明義, 横山彰人, 神谷富裕, 上原政人, 桐生弘武, 佐々木友之, 花泉修, 西川宏之
|
電子情報通信学会技術研究報告 |
110巻
352(OPE2010 131-143)号
|
|
| 2010/01 |
Optical counting of trapped bacteria in dielectrophoretic device with pillar array
Satoshi Uchida, Ryota Nakao, Yasuharu Shiine, Hiroyuki Nishikawa
|
2010 World Automation Congress, WAC 2010 |
18巻
2号
165から
176ページまで
|
AUTOSOFT PRESS |
| 2009/06 |
Fabrication of nanowires by varying energy microbeam lithography using heavy ions at the TIARA
T. Kamiya, K. Takano, Y. Ishii, T. Satoh, M. Oikawa, T. Ohkubo, J. Haga, H. Nishikawa, Y. Furuta, N. Uchiya, S. Seki, M. Sugimoto
|
Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms |
267巻
12-13号
2317から
2320ページまで
|
ELSEVIER SCIENCE BV |
| 2009/06 |
Applications of microstructures fabricated by proton beam writing to electric-micro filters
Yusuke Furuta, Hiroyuki Nishikawa, Takahiro Satoh, Yasuyuki Ishii, Tomihiro Kamiya, Ryota Nakao, Satoshi Uchida
|
Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms |
267巻
12-13号
2285から
2288ページまで
|
ELSEVIER SCIENCE BV |
| 2009/04 |
Electroplating using high-aspect-ratio microstructures fabricated by proton beam writing
Y. Seki, Y. Furuta, H. Nishikawa, T. Watanabe, T. Nakata, T. Satoh, Y. Ishii, T. Kamiya
|
Microelectronic Engineering |
86巻
4-6号
945から
948ページまで
|
ELSEVIER SCIENCE BV |
| 2009/04 |
Fabrication and evaluation of 3D-electric micro filters using proton beam writing
Yusuke Furuta, Hiroyuki Nishikawa, Takahiro Satoh, Yasuyuki Ishii, Tomihiro Kamiya, Ryota Nakao, Satoshi Uchida
|
Microelectronic Engineering |
86巻
4-6号
1396から
1400ページまで
|
ELSEVIER SCIENCE BV |
| 2009/03 |
Development of micromachining technology in ion microbeam system at TIARA, JAEA
T. Kamiya, H. Nishikawa, T. Satoh, J. Haga, M. Oikawa, Y. Ishii, T. Ohkubo, N. Uchiya, Y. Furuta
|
Applied Radiation and Isotopes |
67巻
3号
488から
491ページまで
|
PERGAMON-ELSEVIER SCIENCE LTD |
| 2009/01 |
Micro-pattering of siloxane films by proton beam writing
Hiroyuki Nishikawa, Ryutaro Tsuchiya, Tetsuro Yasukawa, Tomoki Kaneko, Yusuke Furuta, Tomoji Ohishi
|
Journal of Photopolymer Science and Technology |
22巻
2号
239から
243ページまで
|
TECHNICAL ASSOC PHOTOPOLYMERS,JAPAN |
| 2009/01 |
集束プロトンビーム描画による高アスペクト比構造の加工とその応用
西川宏之
|
放射線 |
35巻
2号
77から
86ページまで
|
応用物理学会放射線分科会 |
| 2009/01 |
プロトンビーム描画による波長1.5μm帯用シングルモードPMMA導波路
三浦健太, 町田裕貴, 上原政人, 花泉修, 石井保行, 佐藤隆博, 高野勝昌, 大久保猛, 山崎明義, 井上愛知, 江夏昌志, 横山彰人, 神谷富裕, 小嶋拓治, 西川宏之
|
電子情報通信学会技術研究報告 |
109巻
353(OPE2009 161-171)号
|
|
| 2008/10 |
Ni electroplating on a resist micro-machined by proton beam writing
Naoyuki Uchiya, Yusuke Furuta, Hiroyuki Nishikawa, Tohru Watanabe, Junji Haga, Takahiro Satoh, Masakazu Oikawa, Yasuyuki Ishii,
Tomihiro Kamiya
|
Microsystem Technologies |
14巻
9-11号
1537から
1540ページまで
|
SPRINGER |
| 2008/01 |
集束プロトンビーム描画による微細加工と応用
西川宏之
|
電気学会論文誌 A |
128巻
7号
461から
466ページまで
|
社団法人 電気学会 |
| 2007/08 |
Modification of structural and optical properties of silica glass induced by ion microbeam
H. Nishikawa, M. Murai, T. Nakamura, Y. Ohki, M. Oikawa, T. Sato, T. Sakai, Y. Ishii, M. Fukuda
|
Surface and Coatings Technology |
201巻
19-20 SPEC. ISS.号
8185から
8189ページまで
|
ELSEVIER SCIENCE SA |
| 2007/07 |
Micro-machining of resists on silicon by proton beam writing
Naoyuki Uchiya, Takuya Harada, Masato Murai, Hiroyuki Nishikawa, Junji Haga, Takahiro Sato, Yasuyuki Ishii, Tomihiro Kamiya
|
Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms |
260巻
1号
405から
408ページまで
|
ELSEVIER SCIENCE BV |
| 2007/05 |
集束プロトンビーム描画による微細加工と型加工への応用
西川 宏之, 打矢 直之, 古田 祐介, 吉田 栄治, 芳賀 潤二, 及川 将一, 佐藤 隆博, 石井 保行, 神谷 富裕
|
成形加工 |
19巻
5号
276から
281ページまで
|
|
| 2007/04 |
サブミクロンシリカ微粒子の発光性と構造の相関性
稲井誠一郎, 西川宏之
|
電気電子絶縁材料システムシンポジウム予稿集 |
353巻
5-7号
510から
513ページまで
|
ELSEVIER SCIENCE BV |
| 2007/04 |
Micro-photoluminescence study on defects induced by ion microbeam in silica glass
Masato Murai, Hiroyuki Nishikawa, Tomoharu Nakamura, Hirohiko Aiba, Yoshimichi Ohki, Masakazu Oikawa, Takahiro Sato, Tomihiro
Kamiya
|
Journal of Non-Crystalline Solids |
353巻
5-7号
537から
541ページまで
|
ELSEVIER SCIENCE BV |
| 2007/01 |
Fabrication of high-aspect-ratio pillars by proton beam writing and application to DEP-devices
Y. Furuta, N. Uchiya, H. Nishikawa, J. Haga, M. Oikawa, T. Satoh, Y. Ishii, T. Kamiya, R. Nakao, S. Uchida
|
Digest of Papers - Microprocesses and Nanotechnology 2007; 20th International Microprocesses and Nanotechnology Conference,
MNC
|
340から
341ページまで
|
JAPAN SOCIETY APPLIED PHYSICS |
| 2007/01 |
Fabrication of three-dimensional structures of resist by proton beam writing
Yusuke Furuta, Naoyuki Uchiya, Hiroyuki Nishikawa, Junji Haga, Takahiro Sato, Masakazu Oikawa, Yasuyuki Ishii, Tomihiro Kamiya
|
Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures |
25巻
6号
2171から
2174ページまで
|
A V S AMER INST PHYSICS |
| 2007/01 |
Electroplating of metal micro-structure using a resist micro-machined by proton beam writing
N. Uchiya, Y. Furuta, H. Nishikawa, T. Watanabe, J. Haga, T. Satoh, M. Oikawa, T. Ohkubo, Y. Ishii, T. Kamiya
|
Digest of Papers - Microprocesses and Nanotechnology 2007; 20th International Microprocesses and Nanotechnology Conference,
MNC
|
288から
289ページまで
|
JAPAN SOCIETY APPLIED PHYSICS |
| 2007/01 |
Lithography using focused high-energy proton beam for fabrication of high-aspect-ratio microstructures
H. Nishikawa, Y. Furuta, N. Uchiya, J. Haga, M. Oikawa, T. Satoh, Y. Ishii, T. Kamiya
|
Digest of Papers - Microprocesses and Nanotechnology 2007; 20th International Microprocesses and Nanotechnology Conference,
MNC
|
66から
67ページまで
|
JAPAN SOCIETY APPLIED PHYSICS |
| 2006/01 |
Electron-beam irradiation effects on silica glass studied by cathodoluminescence for solar battery of spacecraft
Takuya Harada, Hiroyuki Nishikawa
|
AIAA 57th International Astronautical Congress, IAC 2006 |
13巻
9253から
9256ページまで
|
|
| 2006/01 |
Spatial distribution of irradiation effects on silica glass induced by 15-MeV oxygen ion microbeam
H. Nishikawa, K. Fukagawa, T. Nakamura, Y. Ohki, M. Oikawa, T. Kamiya, K. Arakawa
|
Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms |
242巻
1-2号
437から
440ページまで
|
ELSEVIER SCIENCE BV |
| 2005/01 |
シリカガラスへのイオンマイクロビーム照射効果と光学素子作製
深川一成, 西川宏之, 中村知晴, 大木義路, 及川将一, 佐藤隆博, 荒川和夫
|
電気電子絶縁材料システムシンポジウム予稿集 |
1巻
210から
213ページまで
|
INST ELECTR ENGINEERS JAPAN |
| 2005/01 |
Effects of thermal anneal on the UV photosensitivity for writing of Bragg gratings on Ge-doped silica thin films by a plasma
CVD method
Tomomi Hattori, Emi Irisawa, Hiroyuki Nishikawa
|
Proceedings of the International Symposium on Electrical Insulating Materials |
3巻
636から
639ページまで
|
|
| 2004/01 |
Effects of Ion Microbeam Irradiation on Silica Glass
H. Nishikawa, K. Fukagawa, T. Yanagi, Y. Ohki, E. Watanabe, M. Oikawa, T. Kamiya, K. Arakawa
|
Trans. Materials Research Society of Japan |
29巻
2号
603から
606ページまで
|
|
| 2003/09 |
Characterization of ion-implanted silica glass by micro-photoluminescence and Raman spectroscopy
T. Souno, H. Nishikawa, M. Hattori, Y. Ohki, E. Watanabe, M. Oikawa, T. Kamiya, K. Arakawa
|
Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms |
210巻
277から
280ページまで
|
ELSEVIER SCIENCE BV |
| 2003/09 |
Characterization of refractive index changes of silica glass induced by ion microbeam
M. Hattori, Y. Ohki, M. Fujimaki, T. Souno, H. Nishikawa, E. Watanabe, M. Oikawa, T. Kamiya, K. Arakawa
|
Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms |
210巻
272から
276ページまで
|
ELSEVIER SCIENCE BV |
| 2003/01 |
Absorption changes induced by UV-photon irradiation in Ge-doped SiO<inf>2</inf> thin films fabricated by plasma CVD method
from tetraethoxysilane
T. Yanagi, Y. Ohki, H. Nishikawa
|
Proceedings of the IEEE International Conference on Properties and Applications of Dielectric Materials |
3巻
1088から
1091ページまで
|
IEEE |
| 2003/01 |
Optical properties of self-assembled silica particles
Y. Tatara, H. Sato, H. Nishikawa
|
Proceedings of the IEEE International Conference on Properties and Applications of Dielectric Materials |
1巻
41から
44ページまで
|
|
| 2002/05 |
イオン注入シリカガラスの真空紫外分光による評価
服部雅晴, 西原義孝, 大木義路, 惣野崇, 西川宏之, 山口嵩之, 渡辺英紀, 神谷富裕, 荒川和夫
|
電気学会放電研究会資料 |
191巻
1-4号
362から
365ページまで
|
ELSEVIER SCIENCE BV |
| 2002/05 |
Evaluation of silica glasses implanted by high-energy ions using a UV-excited microspectroscopy
T. Yamaguchi, E. Watanabe, T. Souno, H. Nishikawa, M. Hattori, Y. Ohki, T. Kamiya, K. Arakawa
|
Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms |
191巻
1-4号
371から
374ページまで
|
ELSEVIER SCIENCE BV |
| 2002/05 |
イオンマイクロビームによるシリカガラスヘの照射効果
惣野崇, 西川宏之, 渡辺英紀, 服部雅晴, 大木義路, 及川将一, 神谷富裕, 荒川和夫
|
電気電子絶縁材料システムシンポジウム予稿集 |
191巻
1-4号
342から
345ページまで
|
ELSEVIER SCIENCE BV |
| 2001/08 |
シリカ系フォトニクスガラスの高機能化
西川 宏之, 大木 義路
|
電気学会論文誌. A, 基礎・材料・共通部門誌 = The transactions of the Institute of Electrical Engineers of Japan. A, A publication of Fundamentals
and Materials Society
|
121巻
8号
721から
724ページまで
|
電気学会 |
| 2001/01 |
シリカ系フォトニクスガラスの高機能化
西川宏之, 大木義路
|
電気学会論文誌 A |
121-A巻
8号
721から
724ページまで
|
一般社団法人 電気学会 |
| 2000/01 |
Photoluminescence characterization of defects in thermal oxide
Hiroyuki Nishikawa, James H. Stathis
|
Materials Research Society Symposium - Proceedings |
592巻
289から
294ページまで
|
MATERIALS RESEARCH SOCIETY |
| 1999/12 |
Temperature dependence of the lifetime of 4.3-eV photoluminescence in oxygen-deficient amorphous SiO2
Kwang Soo Seol, Makoto Fujimaki, Yoshimichi Ohki, Hiroyuki Nishikawa
|
Physical Review B - Condensed Matter and Materials Physics |
59巻
1590から
1593ページまで
|
|
| 1999/12 |
Oxygen-deficient centers and excess Si in buried oxide using photoluminescence spectroscopy
Hiroyuki Nishikawa, Robert E. Stahlbush, James H. Stathis
|
Physical Review B - Condensed Matter and Materials Physics |
60巻
15910から
15918ページまで
|
|
| 1999/08 |
Defects in thermal oxide studied by photoluminescence spectroscopy
Hiroyuki Nishikawa, James H. Stathis, E. Cartier
|
Applied Physics Letters |
75巻
9号
1219から
1221ページまで
|
AMER INST PHYSICS |
| 1999/07 |
Characteristic red photoluminescence band in oxygen-deficient silica glass
Yuryo Sakurai, Kaya Nagasawa, Hiroyuki Nishikawa, Yoshimichi Ohki
|
Journal of Applied Physics |
86巻
1号
370から
373ページまで
|
AMER INST PHYSICS |
| 1999/01 |
Temperature dependence of the lifetime of 4.3-eV photoluminescence in oxygen-deficient amorphous SiO2
KS Seol, M Fujimaki, Y Ohki, H Nishikawa
|
PHYSICAL REVIEW B |
59巻
3号
1590から
1593ページまで
|
AMER PHYSICAL SOC |
| 1999/01 |
Oxygen-deficient centers and excess si in buried oxide using photoluminescence spectroscopy
Hiroyuki Nishikawa
|
Physical Review B - Condensed Matter and Materials Physics |
60巻
23号
15910から
15918ページまで
|
|
| 1998/02 |
Structures and generation mechanisms of paramagnetic centers and absorption bands responsible for Ge-doped SiO2 optical-fiber
gratings
Makoto Fujimaki, Tomofumi Watanabe, Tetsuya Katoh, Toshiaki Kasahara, Nahoko Miyazaki, Yoshimichi Ohki, Hiroyuki Nishikawa
|
Physical Review B - Condensed Matter and Materials Physics |
57巻
3920から
3926ページまで
|
|
| 1998/01 |
Structures and generation mechanisms of paramagnetic centers and absorption bands responsible for Ge-doped optical-fiber gratings
Makoto Fujimaki, Tomofumi Watanabe, Tetsuya Katoh, Toshiaki Kasahara, Nahoko Miyazaki, Yoshimichi Ohki, Hiroyuki Nishikawa
|
Physical Review B - Condensed Matter and Materials Physics |
57巻
7号
3920から
3926ページまで
|
AMER PHYSICAL SOC |
| 1998/01 |
Photoluminescence and electron-spin-resonance studies of defects in amorphous SiO<inf>2</inf> films
H. Nishikawa, H. Fukui, E. Watanabe, D. Ito, K. S. Seol, Y. Ohki
|
Proceedings of the International Symposium on Electrical Insulating Materials |
59から
62ページまで
|
INSTITUTE ELECTRICAL ENGINEERS JAPAN |
| 1997/12 |
Changes in the optical properties of Ge-doped silica glass during exposure to a KrF excimer laser
Yasuhiro Miyake, Hiroyuki Nishikawa, Eiki Watanabe, Daisuke Ito
|
Journal of Non-Crystalline Solids |
222巻
266から
271ページまで
|
ELSEVIER SCIENCE BV |
| 1997/12 |
Changes in the optical properties of Ge-doped silica glass during exposure to a KrF excimer laser
Y Miyake, H Nishikawa, E Watanabe, D Ito
|
JOURNAL OF NON-CRYSTALLINE SOLIDS |
222巻
266から
271ページまで
|
ELSEVIER SCIENCE BV |
| 1997/06 |
Thermal annealing behavior of defects induced by ion implantation in thermally grown SiO<inf>2</inf> films
Kwang Soo Seol, Toshifumi Karasawa, Yoshimichi Ohki, Hiroyuki Nishikawa, Makoto Takiyama
|
Microelectronic Engineering |
36巻
1-4号
193から
195ページまで
|
ELSEVIER SCIENCE BV |
| 1997/02 |
Energy states of Ge-doped SiO<inf>2</inf> glass estimated through absorption and photoluminescence
Makoto Fujimaki, Yoshimichi Ohki, Hiroyuki Nishikawa
|
Journal of Applied Physics |
81巻
3号
1042から
1046ページまで
|
AMER INST PHYSICS |
| 1997/01 |
Luminescence properties of sol-gel synthesized silica glass induced by an ArF excimer laser
K. Mukasa, M. Ono, R. Wakabayashi, K. Ishii, Y. Ohki, H. Nishikawa
|
Journal of Physics D: Applied Physics |
30巻
2号
283から
285ページまで
|
IOP PUBLISHING LTD |
| 1997/01 |
Formation mechanisms of paramagnetic defect centers induced by excimer lasers, gamma rays, and mechanical fracturing in amorphous
SiO<inf>2</inf>
Hiroyuki Nishikawa, Eiki Watanabe, Daisuke Ito, Yoshimichi Ohki
|
Electrical Engineering in Japan (English translation of Denki Gakkai Ronbunshi) |
121巻
3号
9から
19ページまで
|
John Wiley and Sons Inc. |
| 1997/01 |
Evaluation of microscopic structural randomness in SiO<inf>2</inf> by analysis of photoluminescence decay profiles
Keisuke Ishii, Kwang Soo Seol, Yoshimichi Ohki, Hiroyuki Nishikawa
|
Electrical Engineering in Japan (English translation of Denki Gakkai Ronbunshi) |
119巻
3号
1から
6ページまで
|
|
| 1996/12 |
エキシマレーザ, γ線, および機械的応力による非晶質SiO_2中の常磁性中心の生成機構
西川 宏之, 渡辺 英紀, 伊藤 大佐, 大木 義路
|
電気学会論文誌. A, 基礎・材料・共通部門誌 = The transactions of the Institute of Electrical Engineers of Japan. A, A publication of Fundamentals
and Materials Society
|
116巻
12号
1129から
1137ページまで
|
電気学会 |
| 1996/12 |
Effect of implanted ion species on the decay kinetics of 2.7 eV photoluminescence in thermal SiO<inf>2</inf> films
Kwang Soo Seol, Yoshimichi Ohki, Hiroyuki Nishikawa, Makoto Takiyama, Yoshimasa Hama
|
Journal of Applied Physics |
80巻
11号
6444から
6447ページまで
|
AMER INST PHYSICS |
| 1996/10 |
発光減衰曲線の解析によるSiO_2の微視的構造の乱雑さの評価
石井 啓介, 薛 光洙, 大木 義路, 西川 宏之
|
電気学会論文誌. A, 基礎・材料・共通部門誌 = The transactions of the Institute of Electrical Engineers of Japan. A, A publication of Fundamentals
and Materials Society
|
116巻
10号
881から
885ページまで
|
電気学会 |
| 1996/05 |
シリコン酸化膜中の点欠陥の新しい検出法
大木 義路, 石井 啓介, 薛 光洙, 西川 宏之
|
電気学会論文誌. A, 基礎・材料・共通部門誌 = The transactions of the Institute of Electrical Engineers of Japan. A, A publication of Fundamentals
and Materials Society
|
116巻
5号
387から
391ページまで
|
電気学会 |
| 1996/04 |
Laser-power dependence of absorption changes in Ge-doped SiO2 glass induced by a KrF excimer laser
Makoto Fujimaki, Kanta Yagi, Yoshimichi Ohki, Hiroyuki Nishikawa, Koichi Awazu
|
Physical Review B - Condensed Matter and Materials Physics |
53巻
9859から
9862ページまで
|
|
| 1996/01 |
Laser-power dependence of absorption changes in Ge-doped glass induced by a KrF excimer laser
Makoto Fujimaki, Kanta Yagi, Yoshimichi Ohki, Hiroyuki Nishikawa
|
Physical Review B - Condensed Matter and Materials Physics |
53巻
15号
9859から
9862ページまで
|
AMERICAN PHYSICAL SOC |
| 1996/01 |
Photoluminescence and electron-spin-resonance studies of defects in amorphous SiO2 films
H Nishikawa, H Fukui, E Watanabe, D Ito, KS Seol, K Ishii, Y Ohki, M Takiyama, M Tachimori
|
PHYSICS AND CHEMISTRY OF SIO(2) AND THE SI-SIO(2) INTERFACE-3, 1996 |
96巻
1号
418から
427ページまで
|
ELECTROCHEMICAL SOCIETY INC |
| 1996/01 |
Photoluminescence study on point defects in buried SiO<inf>2</inf> film formed by implantation of oxygen
Kwang Soo Seol, Akihito Ieki, Yoshimichi Ohki, Hiroyuki Nishikawa, Masaharu Tachimori
|
Journal of Applied Physics |
79巻
1号
412から
416ページまで
|
AMER INST PHYSICS |
| 1995/01 |
Role of point defects in dielectric breakdown of sio<inf>2</inf>formed by plasma-enhanced chemical vapor deposition of tetraethoxysilane
Keisuke Ishii, Daisuke Isshiki, Yoshimichi Ohki, Hiroyuki Nishikawa, Makoto Takiyama
|
Japanese Journal of Applied Physics |
34巻
1号
205から
211ページまで
|
JAPAN J APPLIED PHYSICS |
| 1995/01 |
Nature of photoluminescence involving transitions from the ground to 4 <inf>f</inf><sup>n-1</sup> 5d<sup>1</sup> states in
rare-earth-doped glasses
T. Yokokawa, H. Inokuma, Y. Ohki, H. Nishikawa, Y. Hama
|
Journal of Applied Physics |
77巻
8号
4013から
4017ページまで
|
AMER INST PHYSICS |
| 1995/01 |
Photoluminescence study on point defects in SIMOX buried SiO<inf>2</inf> film
K. S. Seol, A. Ieki, Y. Ohki, H. Nishikawa, M. Tachimori
|
Materials Science Forum |
196-201巻
pt 4号
1909から
1914ページまで
|
TRANSTEC PUBLICATIONS LTD |
| 1995/01 |
Photoluminescence and electron-spin-resonance studies of defects in ion-implanted thermal SiO<inf>2</inf> films
H. Nishikawa, H. Fukui, E. Watanabe, D. Ito, M. Takiyama, A. Ieki, Y. Ohki
|
Materials Science Forum |
196-201巻
pt 1号
97から
102ページまで
|
TRANSTEC PUBLICATIONS LTD |
| 1995/01 |
Luminescence properties of defects in P<sup>+</sup>- or B<sup>+</sup>-implanted thermally grown silicon dioxide
K. S. Seol, A. Ieki, Y. Ohki, H. Nishikawa, M. Takiyama
|
Proceedings of the Symposium on Electrical Insulating Materials |
85から
88ページまで
|
|
| 1995/01 |
Photoluminescence study of defects in ion-implanted thermal SiO<inf>2</inf> films
Hiroyuki Nishikawa, Eiki Watanabe, Daisuke Ito, Makoto Takiyama, Akihito Ieki, Yoshimichi Ohki
|
Journal of Applied Physics |
78巻
2号
842から
846ページまで
|
AMER INST PHYSICS |
| 1995/01 |
Paramagnetic Defect Centers Induced by Excimer Lasers, γ-rays and Mechanical Fracturing in Amorphous SiO2
H. Nishikawa, Y. Ohki
|
Defect and Diffusion Forum/Scitec Publication |
123-124巻
Part A号
123から
124ページまで
|
|
| 1994/11 |
Kinetics of enhanced photogeneration of E′ centers in oxygen-deficient silica
Hiroyuki Nishikawa, Eiki Watanabe, Daisuke Ito, Yoshimichi Ohki
|
Journal of Non-Crystalline Solids |
179巻
C号
179から
184ページまで
|
ELSEVIER SCIENCE BV |
| 1994/07 |
Gamma-Ray-Induced Loss of E r<sup>3+</sup>-Doped Silica-Core Optical Fiber
Takeshi Koyama, Nobuyuki Dohguchi, Yoshimichi Ohki, Hiroyuki Nishikawa, Yasuo Kusama, Tadao Seguchi
|
Japanese Journal of Applied Physics |
33巻
7R号
3937から
3941ページまで
|
JAPAN J APPLIED PHYSICS |
| 1994/01 |
Point defects in high purity silica induced by high-dose gamma irradiation
Yuryo Sakurai, Kaya Nagasawa, Hiroyuki Nishikawa, Yoshimichi Ohki
|
Journal of Applied Physics |
75巻
3号
1372から
1377ページまで
|
|
| 1994/01 |
Optical characteristics of SiO<inf>2</inf> formed by plasma-enhanced chemical-vapor deposition of tetraethoxysilane
Keisuke Ishii, Yoshimichi Ohki, Hiroyuki Nishikawa
|
Journal of Applied Physics |
76巻
9号
5418から
5422ページまで
|
|
| 1994/01 |
Decay kinetics of the 4.4-eV photoluminescence associated with the two states of oxygen-deficient-type defect in amorphous
SiO2
Hiroyuki Nishikawa, Eiki Watanabe, Daisuke Ito, Yoshimichi Ohki
|
Physical Review Letters |
72巻
13号
2101から
2104ページまで
|
|
| 1993/08 |
ENHANCED PHOTOGENERATION OF E' CENTERS FROM NEUTRAL OXYGEN VACANCIES IN THE PRESENCE OF HYDROGEN IN HIGH-PURITY SILICA GLASS
H NISHIKAWA, R NAKAMURA, Y OHKI, Y HAMA
|
PHYSICAL REVIEW B |
48巻
5号
2968から
2973ページまで
|
AMER PHYSICAL SOC |
| 1993/01 |
Enhanced photogeneration of E′ centers from neutral oxygen vacancies in the presence of hydrogen in high-purity silica glass
Hiroyuki Nishikawa, Ryuta Nakamura, Yoshimichi Ohki, Yoshimasa Hama
|
Physical Review B |
48巻
5号
2968から
2973ページまで
|
|
| 1993/01 |
Correlation of preexisting diamagnetic defect centers with induced paramagnetic defect centers by ultraviolet or vacuum-ultraviolet
photons in high-purity silica glasses
Hiroyuki Nishikawa, Ryuta Nakamura, Yoshimichi Ohki, Yoshimasa Hama
|
Physical Review B |
48巻
21号
15584から
15594ページまで
|
|
| 1993/01 |
Various bonding forms of OH groups in hydrogen-treated silica
Manabu Kitagawa, Hiroyuki Nishikawa, Yoshimichi Ohki, Yoshimasa Hama
|
Journal of Applied Physics |
74巻
4号
2378から
2380ページまで
|
|
| 1992/01 |
ANALYSIS OF BONDING STATE IN PURE SILICA GLASS FROM PARAMAGNETIC DEFECTS INDUCED BY MECHANICAL FRACTURE
Y OHKI, S MUNEKUNI, N DOHGUCHI, H NISHIKAWA, K NAGASAWA, Y HAMA
|
PHYSICS OF NON-CRYSTALLINE SOLIDS |
684から
688ページまで
|
TAYLOR & FRANCIS LTD |
| 1992/01 |
CHLORINE-RELATED AND OXYGEN-RELATED PARAMAGNETIC CENTERS IN VUV-IRRADIATED HIGH-PURITY SILICAS
H NISHIKAWA, R NAKAMURA, K NAGASAWA, Y OHKI, Y HAMA
|
PHYSICS OF NON-CRYSTALLINE SOLIDS |
494から
498ページまで
|
TAYLOR & FRANCIS LTD |
| 1992/01 |
Characterization of ClOx radicals in vacuum-ultraviolet-irradiated high-purity silica glass
Hiroyuki Nishikawa, Ryuta Nakamura, Yoshimichi Ohki, Kaya Nagasawa, Yoshimasa Hama
|
Physical Review B |
46巻
13号
8073から
8079ページまで
|
|
| 1992/01 |
Photoluminescence from defect centers in high-purity silica glasses observed under 7.9-eV excitation
Hiroyuki Nishikawa, Taiji Shiroyama, Ryuta Nakamura, Yoshimichi Ohki, Kaya Nagasawa, Yoshimasa Hama
|
Physical Review B |
45巻
2号
586から
591ページまで
|
AMERICAN PHYSICAL SOC |
| 1991/01 |
Photoluminescence lifetime in silica glasses excited by vacuum ultra violet laser irradiation
Hiroyuki Nishikawa, Ryuta Nakamura, Kaya Nagasawa, Yoshimichi Ohki, Yoshimasa Hama
|
PROCEEDINGS OF THE 3RD INTERNATIONAL CONFERENCE ON PROPERTIES AND APPLICATIONS OF DIELECTRIC MATERIALS, VOLS 1 AND 2 |
1032から
1035ページまで
|
I E E E |
| 1991/01 |
Si - O - Si strained bond and paramagnetic defect centers induced by mechanical fracturing in amorphous SiO<inf>2</inf>
Shuji Munekuni, Nobuyuki Dohguchi, Hiroyuki Nishikawa, Yoshimichi Ohki, Kaya Nagasawa, Yoshimasa Hama
|
Journal of Applied Physics |
70巻
9号
5054から
5062ページまで
|
|
| 1991/01 |
Effect of high-temperature treatment on optical-absorption bands in amorphous SiO<inf>2</inf>
Nobuyuki Dohguchi, Shuji Munekuni, Hiroyuki Nishikawa, Yoshimichi Ohki, Kaya Nagasawa
|
Journal of Applied Physics |
70巻
5号
2788から
2790ページまで
|
|
| 1990/01 |
Paramagnetic centers induced by ArF excimer laser irradiation in high-purity silica glasses
H. Nishikawa, R. Nakamura, R. Tohmon, Y. Ohki, Y. Hama, Y. Sakurai, K. Nagasawa
|
Proceedings of SPIE - The International Society for Optical Engineering |
1327巻
69から
78ページまで
|
SPIE - INT SOC OPTICAL ENGINEERING |
| 1990/01 |
Generation mechanism of photoinduced paramagnetic centers from preexisting precursors in high-purity silicas
Hiroyuki Nishikawa, Ryuta Nakamura, Ryoichi Tohmon, Yoshimichi Ohki, Yuryo Sakurai, Kaya Nagasawa, Yoshimasa Hama
|
Physical Review B |
41巻
11号
7828から
7834ページまで
|
|
| 1989/01 |
Defects and optical absorption bands induced by surplus oxygen in high-purity synthetic silica
Hiroyuki Nishikawa, Ryoichi Tohmon, Yoshimichi Ohki, Kaya Nagasawa, Yoshimasa Hama
|
Journal of Applied Physics |
65巻
12号
4672から
4678ページまで
|
|
| 1989/01 |
Role of nonstoichiometry on UV absorption and luminescence in high-purity silica.
Hiroyuki Nishikawa, Ryoichi Tohmon, Kaya Nagasawa, Yoshimichi Ohki, Yoshimasa Hama
|
Proceedings of SPIE - The International Society for Optical Engineering |
1128巻
281から
289ページまで
|
SPIE - INT SOC OPTICAL ENGINEERING |
| 1989/01 |
325-nm absorption band by peroxy linkage in pure silica core fiber
H. Nishikawa, R. Tohmon, Y. Ohki, Y. Hama, K. Nagasawa
|
|
158から
159ページまで
|
|